Alireza Moghadam Phones & Addresses
-
1370 Corte Bonita, San Jose, CA 95120
-
5055 Dent Ave, San Jose, CA 95118
-
Fremont, CA
-
Santa Clara, CA
Publications
Us Patents
Substrate Edge Inspection
View pageUS Patent:
8325334, Dec 4, 2012
Filed:
Aug 18, 2010
Appl. No.:
12/858669
Inventors:
Mahendra P. Ramachandran - Palo Alto CA, US
Steven W. Meeks - Palo Alto CA, US
Alireza S. Moghadam - San Jose CA, US
Hung P. Nguyen - Santa Clara CA, US
Steven W. Meeks - Palo Alto CA, US
Alireza S. Moghadam - San Jose CA, US
Hung P. Nguyen - Santa Clara CA, US
Assignee:
KLA-Tencor Corporation - Milpitas CA
International Classification:
G01N 21/00
G01N 21/55
G01N 21/55
US Classification:
3562371, 356445, 3562372, 3562374, 3562375
Abstract:
An apparatus for inspecting an edge of a substrate. A light source produces a light beam, and a two-dimensional beam deflector receives the light beam and creates a semi-annular scanning beam. A first flared parabolic surface receives the semi-annular scanning beam and directs the semi-annular scanning beam onto the edge of the substrate, thereby creating specularly reflected light from the edge of the substrate. A second flared parabolic surface receives and directs the specularly reflected light to a detector. The detector receives the directed specularly reflected light and produces signals. An analyzer analyzes the signals and detects defects at the edge of the substrate.
Wide Spatial Frequency Topography And Roughness Measurement
View pageUS Patent:
7362425, Apr 22, 2008
Filed:
Mar 23, 2006
Appl. No.:
11/387952
Inventors:
Steven W. Meeks - Fremont CA, US
Mahendra Prabhu Ramachandran - Palo Alto CA, US
Alireza Shahdoost Moghadam - San Jose CA, US
Mahendra Prabhu Ramachandran - Palo Alto CA, US
Alireza Shahdoost Moghadam - San Jose CA, US
International Classification:
G01N 21/00
US Classification:
356 73
Abstract:
In one embodiment, a system to inspect a surface comprises an assembly to direct a first radiation beam onto a surface in a first plane of incidence, a first detector to generate a first signal from a portion of the radiation reflected from the first radiation beam, a first spatial filter interposed between the surface and the first detector, a first ellipsoidal mirror to collect scattered light, a second detector to generate a second signal from the scattered portion of the beam, and a processor to generate, from the first and second signals, a data set representing one or more characteristics of the surface using the first and second signals.
System And Method For Optimizing Wafer Flatness At High Rotational Speeds
View pageUS Patent:
7396022, Jul 8, 2008
Filed:
Sep 28, 2004
Appl. No.:
10/952590
Inventors:
Alireza Shahdoost Moghadam - San Jose CA, US
Vamsi Mohan Velidandla - Hayward CA, US
Vamsi Mohan Velidandla - Hayward CA, US
Assignee:
KLA-Tencor Technologies Corp. - Milpitas CA
International Classification:
B23B 31/30
US Classification:
279 3, 269 21, 118500, 451388
Abstract:
The present invention is a chuck having a vacuum groove that is capable of holding a wafer as the chuck rotates on a spindle. As the chuck rotates the air pressure above the center of the wafer is reduced. In order to reduce the bowing of the wafer that can result from this low pressure area above the wafer, the present invention introduces venturi holes in the chuck which reduces the air pressure in the area below the wafer. In order to prevent the air pressure in the area below the wafer from decreasing too far, the present invention uses air inlet holes to balance the affect of the venturi holes in order to substantially balance the air pressure above and below the wafer which results in significantly less bowing of the wafer when compared to conventional systems. The present invention accomplishes this without requiring sensors or other active measuring devices to help reduce the bowing of the wafer.