Chau Nguyen

6354241, Mar 12, 2002

Jul 15, 1999

09/354925

Tsutomu Tanaka - Santa Clara CA
Chau Nguyen - San Jose CA
Hari Ponnekanti - Santa Clara CA
Kevin Fairbairn - Saratoga CA
Mark Fodor - Los Gatos CA

Applied Materials, Inc. - Santa Clara CA

C23C 1600

118723E, 118715

An apparatus and method for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor-processing device. The apparatus includes a vessel chamber having an inlet, an outlet and a fluid conduit between the two that fluidly couples the outlet with the inlet. The fluid conduit includes first and second collection sections. The first collection section includes a first plurality of electrodes aligned parallel to a first plane and the second collection section includes a second plurality of electrodes aligned parallel to a second plane that is substantially perpendicular to the first plane. The electrodes are connected to a voltage differential to form an electrostatic particle collector that traps electrically charged particles and particulate matter flowing through the fluid conduit. Particles are collected on the electrodes within the fluid conduit during substrate processing operations such as CVD deposition steps. Then, during a chamber clean operation, unreacted etchant gases used to clean the substrate processing chamber are exhausted through the foreline and into the apparatus of the present invention where they react with the collected particles and powder to convert the solid material into gaseous matter that can be pumped through the foreline without damaging the vacuum pump or other processing equipment.

6616973, Sep 9, 2003

Nov 12, 1998

09/190961

Chau Nguyen - San Jose CA
Visweswaren Sivaramakrishnan - Cupertino CA

Applied Materials, Inc. - Santa Clara CA

C23C 1600

42725538, 4272481, 118715, 118726, 148325, 261 38, 261 62, 261 781, 261 782, 2611211, 261128, 137561 R, 392400

The present invention recognizes that the build-up of residue in a metal alloy injection valve used to inject a liquid phosphorous precursor compound is due to the nickel in the alloy affecting the liquid phosphorous precursor compound. The invention thus provides components manufactured of an alloy having a low nickel content, preferably less than 5% nickel, and more preferably less than 1%. In an additional aspect of the invention, the alloy is provided with a higher chromium content, preferably at least 15% chromium, more preferably 16-27%.

20030069973, Apr 10, 2003

Jul 8, 2002

10/191746

Elango Ganesan - Palo Alto CA, US
Yen Lee - San Jose CA, US
Chau Nguyen - San Jose CA, US
John Phillips - Santa Clara CA, US
Andy Zhou - Alameda CA, US
Greg Spurrier - Sunnyvale CA, US
Michael Freed - Pleasanton CA, US
Mark Bryers - Granite Bay CA, US
Nazar Zaidi - San Jose CA, US

G06F015/173

709/226000, 709/246000, 709/232000

An architecture for controlling a multiprocessing system to provide at least one network service to subscriber data packets transmitted in the system using a plurality of compute elements, comprising a management compute element including service set-up information for at least one service and at least one processing compute element applying said at least one network service to said data packets and communicating service set-up information with the management compute element in order to perform service specific operations on data packets. In a further embodiment, a method of controlling a processing system including a plurality of processors is disclosed. The method comprises the steps of operating at least one of said processors as a control authority providing service provisioning information for a subscriber; and operating a set of processors as a service specific compute element responsive to the control authority, receiving provisioning information from the subscriber and performing service specific instructions on data packets to provide IP content services.

20030126233, Jul 3, 2003

Jul 8, 2002

10/191742

Mark Bryers - Granite Bay CA, US
Elango Ganesan - Palo Alto CA, US
Frederick Gruner - Palo Alto CA, US
David Hass - Santa Clara CA, US
Robert Hathaway - Sunnyvale CA, US
Ramesh Panwar - Pleasanton CA, US
Ricardo Ramirez - Sunnyvale CA, US
Abbas Rashid - Fremont CA, US
Mark Vilas - San Jose CA, US
Nazar Zaidi - Palo Alto CA, US
Yen Lee - San Jose CA, US
Chau Nguyen - San Jose CA, US
John Phillips - Santa Clara CA, US
Yuhong Zhou - Alameda CA, US
Gregory Spurrier - Sunnyvale CA, US
Michael Freed - Pleasanton CA, US

G06F015/16

709/219000

A network content service apparatus includes a set of compute elements adapted to perform a set of network services; and a switching fabric coupling compute elements in said set of compute elements. The set of network services includes firewall protection, Network Address Translation, Internet Protocol forwarding, bandwidth management, Secure Sockets Layer operations, Web caching, Web switching, and virtual private networking. Code operable on the compute elements enables the network services, and the compute elements are provided on blades which further include at least one input/output port.

20040020601, Feb 5, 2004

Jul 29, 2003

10/631303

Jun Zhao - Cupertine CA, US
Farhad Moghadam - Saratoga CA, US
Tim Weidman - Sunnyvale CA, US
Rick Roberts - Sunnyvale CA, US
Hari Ponnekanti - San Jose CA, US
Chau Nguyen - San Jose CA, US
Satish Sundar - Milpitas CA, US
David Quach - San Jose CA, US
Sasson Somekh - Los Altos Hills CA, US

Applied Materials, Inc. - Santa Clara CA

H01L021/306
C23C016/00

156/345320, 118/72300E

A series of modular apparatuses for processing substrates using a unique combinations of a substrate coating subsystem, a substrate curing subsystem and a PECVD-based capping subsystem. The individual subsystems are capable of being combined with one another for creating unique integrated substrate processing apparatuses that enable combined processing by the coating, curing and capping subsystems in an integrated and controlled environment, thus enabling the processing of substrates in an efficient manner, while minimizing the exposure of the substrates to an external environment and minimizing the condensation of vapors while the substrate is processed by the cure and capping subsystems.

20080114887, May 15, 2008

Nov 7, 2007

11/983135

Mark Bryers - Granite Bay CA, US
Elango Ganesan - Palo Alto CA, US
Frederick Gruner - Palo Alto CA, US
David Hass - Santa Clara CA, US
Robert Hathaway - Sunnyvale CA, US
Ramesh Panwar - Pleasanton CA, US
Ricardo Ramirez - Sunnyvale CA, US
Abbas Rashid - Fremont CA, US
Mark Vilas - San Jose CA, US
Nazar Zaidi - San Jose CA, US
Yen Lee - San Jose CA, US
Chau Nguyen - San Jose CA, US
John Phillips - Santa Clara CA, US
Yuhong Zhou - Alameda CA, US
Gregory Spurrier - Sunnyvale CA, US
Michael Freed - Pleasanton CA, US

Juniper Networks, Inc. - Sunnyvale CA

G06F 15/16

709230000, 709249000

A network content service apparatus includes a set of compute elements adapted to perform a set of network services; and a switching fabric coupling compute elements in said set of compute elements. The set of network services includes firewall protection, Network Address Translation, Internet Protocol forwarding, bandwidth management, Secure Sockets Layer operations, Web caching, Web switching, and virtual private networking. Code operable on the compute elements enables the network services, and the compute elements are provided on blades which further include at least one input/output port.

20120171807, Jul 5, 2012

Dec 27, 2011

13/338173

Alexander J. BERGER - Palo Alto CA, US
Terry BLUCK - Santa Clara CA, US
Vinay SHAH - San Mateo CA, US
Judy HUANG - Los Gatos CA, US
Karthik JANAKIRAMAN - San Jose CA, US
Chau T. NGUYEN - San Jose CA, US
Greg STUMBO - Scotts Valley CA, US

H01L 31/18
B05B 15/00
B05B 1/00

438 73, 118679, 257E31001

Disclosed are methods and apparatus for masking of substrates for deposition, and subsequent lifting of the mask with deposited material. Masking materials are utilized that can be used in high temperatures and vacuum environment. The masking material has minimal outgassing once inside a vacuum chamber and withstand the temperatures during deposition process. The mask is inkjeted over the wafers and, after deposition, removed using agitation, such as ultrasonic agitation, or using laser burn off.

61630071, Dec 19, 2000

Mar 19, 1999

9/272898

Tsutomu Tanaka - Santa Clara CA
Thomas Nowak - Sunnyvale CA
Chau Nguyen - San Jose CA
Hari Ponnekanti - Fremont CA
Kevin Fairbairn - Saratoga CA

Applied Materials, Inc. - Santa Clara CA

B23K 900

21912148

Apparatus for dissociating cleaning gas such as NF. sub. 3 for use in semiconductor manufacturing includes a housing enclosing a microwave resonator to which microwave energy is applied, a plasma tube within the housing and within which cleaning gas flows and is dissociated by the microwave energy. The plasma tube has two ends into and out of which the cleaning gas flows. A first and a second structural assembly thermally protects and seals each end of the plasma tube against atmospheric leaks. Each structural assembly has a metal collar and a sealing O-ring fitting tightly around a respective end of the plasma tube. Each metal collar includes a thin layer of elastomeric material of high thermal conductivity for conducting heat through the collar away from the end of the plasma tube thereby protecting the O-ring from heat damage. This permits the apparatus to operate more efficiently. A fan forces ambient air over the apparatus.