Dong C Yu

6632323, Oct 14, 2003

Jan 31, 2001

09/772850

Steven Kim - Harrington Park NJ
Dong Woo Yu - Demarest NJ

Plasmion Corporation - Hoboken NJ

H05H 100

15634543, 15634547, 15634534, 15634533, 118723 E, 118723 DC

A method and an apparatus for treating a workpiece using a plasma are disclosed in the present invention. In treating a workpiece using a plasma, the apparatus includes at least one pin electrode for receiving a power source, a dielectric body having first and second sides, wherein the first side is coupled to the pin electrode and the second side has at least one capillary extending to a direction of the first side of the dielectric body, and each capillary is substantially aligned with each pin electrode, and a counter electrode electrically coupled to the pin electrode for generating the plasma from each capillary.

7240373, Jul 10, 2007

Jul 14, 2004

10/890724

Oliver Ahn - Cedar Grove NJ, US
Dong Won Yu - Syosset NY, US

3Sixty Innovations, LLC - Jericho NY

A42B 1/00

21951, 21751, 2181

The hat crown has a lower periphery, an outside and inside, a horizontal brim and a headband placed radially inward from the crown's interior. A sliding assembly has one member fixed to the crown's inside and a second slidably attached to the first as a extension to the brim. The brim may then be rotated along the crown. The crown's material includes a fold folded inward to form a finished edge along the lower periphery. The fold, securely attached to the main portion, forms an upper edge. The first member has a flat base fixed to the fold or arranged at the flap's top and connected directly to the crown in any suitable way. If the crown is seamed, the headband can be tacked on or near the seam lines. The headband may also surround the lower periphery incompletely so as to create a gap with two edges, an elastic band separating them and stretching to adapt to the wearer's head.

7877256, Jan 25, 2011

Feb 17, 2006

11/356905

Xiaolong Li - White Plains NY, US
Li Deng - Sammamish WA, US
Dong Yu - Kirkland WA, US
Alejandro Acero - Bellevue WA, US

Microsoft Corporation - Redmond WA

G10L 15/14

704256, 704231, 704242

A time-synchronous lattice-constrained search algorithm is developed and used to process a linguistic model of speech that has a long-contextual-span capability. In the algorithm, hypotheses are represented as traces that include an indication of a current frame, previous frames and future frames. Each frame can include an associated linguistic unit such as a phone or units that are derived from a phone. Additionally, pruning strategies can be applied to speed up the search. Further, word-ending recombination methods are developed to speed up the computation. These methods can effectively deal with an exponentially increased search space.

20020122896, Sep 5, 2002

Mar 2, 2001

09/796488

Steven Kim - Harrington Park NJ, US
Dong Yu - Demarest NJ, US
Seungdeok Kim - Palisades Park NJ, US

SKION CORPORATION

H05H001/24
C23F001/00
C23C016/00
H01L021/3065

427/569000, 118/72300E, 156/345340

A plasma treatment apparatus for a workpiece includes a metal electrode, a capillary dielectric having first and second sides and coupled to the metal electrode through the first side, wherein the capillary dielectric has at least one capillary, a shield body surrounding the metal electrode and the first side of the capillary dielectric, wherein the shield body has first and second end portions, and a gas supplier providing gas to the metal electrode.

20020139659, Oct 3, 2002

Apr 3, 2001

09/823985

Dong Yu - Demarest NJ, US
Steven Kim - Harrington Park NJ, US

SKION CORPORATION

B01J019/08

204/164000, 422/186000

A plasma apparatus for treating a fluid includes a fluid conduit, a first metal electrode and a second metal electrode mounted in the fluid conduit and receiving a potential, a capillary dielectric between the first and second metal electrodes, wherein the capillary dielectric has at least one capillary, a shield body surrounding at least a portion of the first metal electrode, and a gas supplier providing a sufficient amount of working gas to the first and second metal electrodes, thereby generating a continuous plasma shower within the conduit.

20020148816, Oct 17, 2002

Aug 23, 2001

09/935047

Chang Jung - Seoul, KR
Jong Jeong - Seoul, KR
Hyun So - Chungcheongbuk-do, KR
Dong Yu - Demarest NJ, US
Steven Kim - Harrington Park NJ, US

B23K010/00

219/121410, 219/121430, 219/121590

A method and apparatus for treating a workpiece using capillary discharge plasma are disclosed in the present invention. More specifically, a method of desmearing holes in a copper laminated board and forming a conductive material in the holes using an atmospheric pressure capillary discharge plasma apparatus having at least one first electrode receiving a power source, a dielectric body having first and second sides, the first side coupled to the first electrode and the second side having at least one capillary extending to a direction of the first side of the dielectric body, and each capillary substantially aligned with each electrode, and a second electrode electrically coupled to the first electrode, the method comprising the steps of drilling the copper laminated board to remove at least a portion of the copper laminated board, placing the copper laminated board having the holes in the apparatus, applying a potential to the plasma generator, providing a working gas in close proximity to the copper laminated board, generating capillary discharge plasma out of the capillary, thereby treating the copper laminated board with the atmospheric pressure capillary discharge plasma to remove resin residues in the holes, and forming the conductive material on the copper laminated board including in the holes.

20020187066, Dec 12, 2002

Jun 7, 2001

09/875041

Dong Yu - Demarest NJ, US
Steven Kim - Harrington Park NJ, US

SKION CORPORATION

A61L002/00
B01J019/08

422/022000, 422/023000, 422/186040, 422/186050, 250/455110

An apparatus for sterilizing an article using capillary discharge atmospheric pressure plasma is disclosed. The apparatus includes a power supplier providing a potential to the apparatus, a plasma generating head, a gas supplier providing a sufficient amount of working gas to the plasma generating head, and a body including a handle and coupled to the plasma generating head and the gas supplier. The plasma generating head includes, a metal electrode receiving the potential, a dielectric having at least one capillary therein coupled to the metal electrode, and a shield body surrounding at least a portion of the metal electrode except for the capillary.

20030015505, Jan 23, 2003

Jul 19, 2001

09/907569

Dong Yu - Demarest NJ, US
Steven Kim - Harrington Park NJ, US

SKION CORPORATION

B23K010/00

219/121430, 219/121580

The present invention discloses an apparatus and method for sterilization of articles using capillary discharge atmospheric plasma. More specifically, an apparatus for sterilizing articles using substantially atmospheric pressure plasma includes a plasma generator generating the substantially atmospheric pressure plasma, wherein the plasma generator includes, first and second dielectrics facing into each other, wherein at least one capillary is formed in at least one of the dielectrics, and first and second electrodes on the first and second dielectric bodies, receiving the potential from the power supply, a processing chamber enclosing the plasma generator, and a power supply providing a potential to the plasma generator.