Ryan A Downey

20220199380, Jun 23, 2022

Jun 2, 2020

17/610675

- Santa Clara CA, US
Ryan Thomas DOWNEY - San Jose CA, US

H01J 37/32
B01D 45/16
B01D 51/06

Embodiments disclosed herein include a particle collection trap for an abatement system for abating compounds produced in semiconductor processes. The particle collection trap includes a device for producing spiral gas flow in the particle collection trap. The spiral gas flow causes particles, which are heavier than the gas, to travel to the outside diameter of the flow path where the gas velocity is slower and to drop out of the gas stream. The device may be a spiral member coupled to a hollow tube or a rolled member having an inner portion coupled to a hollow tube. The particle collection trap increases the accumulation rate of particles in the gas stream without reducing the velocity of the gas flow.

20190034060, Jan 31, 2019

Jul 31, 2017

15/665168

- New York NY, US
Ryan Andrew Downey - Menlo Park CA, US

G06F 3/0484
H04L 29/12
G06F 17/30

Systems and methods for automated content provisioning to a user device are disclosed herein. The system can include a memory including a user profile database containing information relating to a plurality of users and a content library database including a plurality of data packets. The system can include at least one server and a user device. The user device can: receive a request for content receipt; send an electrical signal containing a content request to the server; send an electrical signal containing hardware configuration data to the server; receive first data packets; launch evaluation software; evaluate received response data with the launched evaluation software; generate outcome data for a plurality of attributes of the received response data; and automatically deliver second presentation data received in second data packets.

20190034826, Jan 31, 2019

Jul 31, 2017

15/665241

- New York NY, US
Ryan Andrew Downey - Menlo Park CA, US

G06N 99/00
G10L 15/02
G10L 15/22
G10L 15/26
H04L 29/06

Systems and methods for automated content provisioning to a user device are disclosed herein. The system can include a memory including a user profile database containing information relating to a plurality of users and a content library database including a plurality of data packets. The system can include at least one server and a user device. The user device can: receive a request for content receipt; send an electrical signal containing a content request to the server; send an electrical signal containing hardware configuration data to the server; receive first data packets; launch evaluation software; evaluate received response data with the launched evaluation software; generate outcome data for a plurality of attributes of the received response data; and automatically deliver second presentation data received in second data packets.

20190036775, Jan 31, 2019

Jul 31, 2017

15/665093

- New York NY, US
Ryan Andrew Downey - Menlo Park CA, US

H04L 12/24
H04L 29/08
H04L 12/26

Systems and methods for automated content provisioning to a user device are disclosed herein. The system can include a memory including a user profile database containing information relating to a plurality of users and a content library database including a plurality of data packets. The system can include at least one server and a user device. The user device can: receive a request for content receipt; send an electrical signal containing a content request to the server; send an electrical signal containing hardware configuration data to the server; receive first data packets; launch evaluation software; evaluate received response data with the launched evaluation software; generate outcome data for a plurality of attributes of the received response data; and automatically deliver second presentation data received in second data packets.

20180337027, Nov 22, 2018

Apr 24, 2018

15/961482

- Santa Clara CA, US
Ryan T. DOWNEY - San Jose CA, US
David Muquing HOU - Cupertino CA, US
Yan ROZENZON - San Carlos CA, US

H01J 37/32
H01L 21/67
B01D 53/32

Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream of the plate. During operation, materials collected on the plate react with cleaning radicals to form a gas. The temperature of the plate is higher than the temperature of the cooling plate in order to improve the reaction rate of the reaction of the cleaning radicals and the materials on the plate.

20180221816, Aug 9, 2018

Feb 2, 2018

15/887834

- Santa Clara CA, US
Dustin W. HO - Shanghai, CN
Zheng YUAN - Santa Clara CA, US
James L'HEUREUX - Santa Clara CA, US
Ryan T. DOWNEY - San Jose CA, US

B01D 53/56
B01D 53/76
B01D 53/34
H01L 21/67
G05D 16/20

Embodiments of the present disclosure generally relate techniques for abating NO gas present in the effluent of semiconductor manufacturing processes. In one embodiment, a method includes injecting hydrogen gas or ammonia gas into a plasma source, and an effluent containing NO gas and the hydrogen or ammonia gas are energized and reacted to form an abated material. By using the hydrogen gas or the ammonia gas, the destruction and removal efficiency (DRE) of the NO gas is at least 50 percent while the concentration of nitric oxide (NO) and/or nitrogen dioxide (NO) in the abated material is substantially reduced, such as at most 5000 parts per million (ppm) by volume.