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Timothy K Thomas

from Belmont, NC
Age ~37
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Also known as:
Timothy Kyle Thomas
Phone and address:
1144 Mckee Farm Ln, Catawba Heights, NC 28012
(704) 860-7367
Related to:
Jason M Thomas, 37Michael Thomas, 45
Connected to:
Aames I Thomas, 60Adelaide J Thomas, 92Adolphus Thomas, 76Adoracion Q Thomas, 68Adrenann S Thomas, 48Adrianetta A Thomas, 62Adrik M Thomas, 37Agenia L Thomas, 58Agnus Thomas, 43Airene A Thomas, 37

Timothy Thomas Phones & Addresses

  • 1144 Mckee Farm Ln, Belmont, NC 28012 (704) 860-7367
  • Mount Holly, NC
  • Somerville, MA
  • Cambridge, MA
  • 1822 Old Highway 27, Mount Holly, NC 28120 (704) 822-0664

Professional Records

Lawyers & Attorneys

Timothy Thomas Photo 1

Timothy E. Thomas, Marblehead MA - Lawyer

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Address:
10 Leggs Hill Rd., Marblehead, MA 01945
(781) 710-7471 (Office)
Licenses:
Massachusetts - Active 2009

Resumes

Resumes

Timothy Thomas Photo 2

Se Region Survey Manager At Merrick & Company

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Location:
Charlotte, North Carolina Area
Industry:
Civil Engineering
Timothy Thomas Photo 3

Independent Financial Services Professional

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Location:
Charlotte, North Carolina Area
Industry:
Financial Services
Education:
School name:
Timothy Thomas Photo 4

Timothy Thomas Norton, MA

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Work:
Allied Barton Security Services

Feb 2011 to 2000
security officer
Providence Highway
Sharon, MA
Feb 2007 to Aug 2010
mail room
Matt Jordan
Foxborough, MA
2006 to 2007
landscaping
Player's choice
Mansfield, MA
Feb 2002 to Apr 2005
costodian
Mansfield Avenue
Norton, MA
2001 to 2002
Bagged groceries and basic customers service responsibilities assisting customers
Education:
Norton High School
Norton, MA
2005
diploma in teaching

Business Records

Name / Title
Company / Classification
Phones & Addresses
Timothy Thomas
Technician
Dentaquest Ventures LLC
Investors
465 Medford St, Boston, MA 02129
Timothy Thomas
Technician
Dentaquest Ventures LLC
Investors
465 Medford St, Boston, MA 02129
Timothy W. Thomas
Owner
Thomas Siding
Roofing/Siding Contractor
1056 Harper Gault Rd, Rock Hill, SC 29730
(803) 366-5559
Timothy W. Thomas
Principal
Timothy Wayne Thomas
Business Services at Non-Commercial Site
1056 Harper Gault Rd, Rock Hill, SC 29730
Timothy Thomas
Principal
Timothy E Thomas
Business Services at Non-Commercial Site · Nonclassifiable Establishments
668 Ennis Rd, Waxhaw, NC 28173
Timothy Thomas
Technician
Dentaquest Ventures LLC
Investor · Insurance Companies
465 Medford St, Boston, MA 02129
(617) 886-1000, (617) 886-1818, (888) 788-8600, (617) 886-1502

Publications

Us Patents

Fast Axis Beam Profile Shaping By Collimation Lenslets For High Power Laser Diode Based Annealing System

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US Patent:
7674999, Mar 9, 2010
Filed:
Aug 23, 2006
Appl. No.:
11/508781
Inventors:
Dean Jennings - Beverly MA, US
Abhilash J. Mayur - Salinas CA, US
Timothy N. Thomas - Portland OR, US
Vijay Parihar - Fremont CA, US
Vedapuram S. Achutharaman - San Jose CA, US
Randhir P. S. Thakur - San Jose CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01L 21/324
H01L 21/477
US Classification:
21912165, 21912175, 372 50122
Abstract:
A dynamic surface anneal apparatus for annealing a semiconductor workpiece has a workpiece support for supporting a workpiece, an optical source and scanning apparatus for scanning the optical source and the workpiece support relative to one another along a fast axis. The optical source includes an array of laser emitters arranged generally in successive rows of the emitters, the rows being transverse to the fast axis. Plural collimating lenslets overlie respective ones of the rows of emitters and provide collimation along the fast axis. The selected lenslets have one or a succession of optical deflection angles corresponding to beam deflections along the fast axis for respective rows of emitters. Optics focus light from the array of laser emitters onto a surface of the workpiece to form a succession of line beams transverse to the fast axis spaced along the fast axis in accordance with the succession of deflection angles.

High Speed Phase Scrambling Of A Coherent Beam Using Plasma

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US Patent:
7795816, Sep 14, 2010
Filed:
Oct 8, 2007
Appl. No.:
11/868933
Inventors:
Dean Jennings - Beverly MA, US
Bruce E. Adams - Portland OR, US
Timothy N. Thomas - Portland OR, US
Stephen Moffatt - Millbrook, St. Lawrence, GB
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H05B 31/26
US Classification:
31511121
Abstract:
A laser beam is modulated at a very high frequency to produce uniform radiant flux densities on substrate surface processing regions during thermal processing. Beam modulation is achieved by passing the laser beam through a plasma which causes phase randomization within the laser beam. This method may be used for any application where intense, uniform illumination is desired, such as pulsed laser annealing, ablating, and wafer stepper illuminating.

Combined Illumination And Imaging System

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US Patent:
7837357, Nov 23, 2010
Filed:
Jun 30, 2006
Appl. No.:
11/480133
Inventors:
Dean C. Jennings - Beverly MA, US
Timothy N. Thomas - Portland OR, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
F21S 8/00
G02B 21/06
F21V 9/14
US Classification:
362268, 362 19, 362 29, 362293, 359385
Abstract:
An illumination system has a light source, an optical train, and a wavelength beam splitter. The optical train focuses light from the light source into a defined geometrical pattern on a surface. The wavelength beam splitter transmits light of a first wavelength and redirects light of a second wavelength. One of these wavelengths is included by the light from the light source, while the other is an emission wavelength generated by thermal excitation of the surface by the focused geometrical pattern.

Autofocus For High Power Laser Diode Based Annealing System

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US Patent:
7910499, Mar 22, 2011
Filed:
Aug 5, 2005
Appl. No.:
11/198660
Inventors:
Dean Jennings - Beverly MA, US
Timothy N. Thomas - Portland OR, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01L 21/00
US Classification:
438795, 438473
Abstract:
Apparatus for thermally processing a substrate includes a source of laser radiation comprising a plurality diode lasers arranged along a slow axis, optics directing the laser radiation from the source to the substrate, and an array of photodetectors arranged along a fast axis perpendicular to the slow axis and receiving portions of the laser radiation reflected from the substrate through the optics.

Fast Axis Beam Profile Shaping For High Power Laser Diode Based Annealing System

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US Patent:
8288683, Oct 16, 2012
Filed:
Nov 4, 2008
Appl. No.:
12/291002
Inventors:
Dean Jennings - Beverly MA, US
Abhilash J. Mayur - Salinas CA, US
Timothy N. Thomas - Portland OR, US
Vijay Parihar - Fremont CA, US
Vedapuram S. Achutharaman - San Jose CA, US
Randhir P. S. Thakur - San Jose CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
B23K 26/00
US Classification:
21912176, 117204, 117904
Abstract:
A dynamic surface anneal apparatus for annealing a semiconductor workpiece has a workpiece support for supporting a workpiece, an optical source and scanning apparatus for scanning the optical source and the workpiece support relative to one another along a fast axis. The optical source includes an array of laser emitters arranged generally in successive rows of the emitters, the rows being transverse to the fast axis. Plural collimating lenslets overlie respective ones of the rows of emitters and provide collimation along the fast axis. The selected lenslets have one or a succession of optical deflection angles corresponding to beam deflections along the fast axis for respective rows of emitters. Optics focus light from the array of laser emitters onto a surface of the workpiece to form a succession of line beams transverse to the fast axis spaced along the fast axis in accordance with the succession of deflection angles.

Method And Apparatus For Decorrelation Of Spatially And Temporally Coherent Light

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US Patent:
8363320, Jan 29, 2013
Filed:
Apr 27, 2011
Appl. No.:
13/095758
Inventors:
Dean Jennings - Beverly MA, US
Timothy N. Thomas - Portland OR, US
Stephen Moffatt - Channel Islands, GB
Jiping Li - Palo Alto CA, US
Bruce E. Adams - Portland OR, US
Samuel C. Howells - Portland OR, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
G02B 5/30
US Classification:
35948907
Abstract:
A method and apparatus for decorrelating coherent light from a light source, such as a pulsed laser, in both time and space in an effort to provide intense and uniform illumination are provided. The techniques and apparatus described herein may be incorporated into any application where intense, uniform illumination is desired, such as pulsed laser annealing, welding, ablating, and wafer stepper illuminating.

Multi-Stage Optical Homogenization

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US Patent:
8432613, Apr 30, 2013
Filed:
Apr 18, 2010
Appl. No.:
12/762351
Inventors:
Dean C. Jennings - Beverly MA, US
Timothy N. Thomas - Portland OR, US
Samuel C. Howells - Portland OR, US
Bruce E. Adams - Portland OR, US
Jiping Li - Palo Alto CA, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
G02B 27/10
US Classification:
359626, 359622
Abstract:
Substrate processing equipment and methods are used to improve the uniformity of illumination across an illuminated portion of a substrate by processing light with multiple optical homogenizers. The multiple optical homogenizers each include micro-lens arrays and Fourier lens. The multiple optical homogenizers are arranged so that the output numerical aperture of one of the optical homogenizers is within 5% of the input numerical aperture of another optical homogenizer.

Apparatus For Thermal Processing Structures Formed On A Substrate

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US Patent:
20070221640, Sep 27, 2007
Filed:
Jul 25, 2006
Appl. No.:
11/459852
Inventors:
Dean Jennings - Beverly MA, US
Alexander N. Lerner - San Jose CA, US
Abhilash Mayur - Salinas CA, US
Stephen Moffatt - Jersey, GB
Timothy N. Thomas - Portland OR, US
International Classification:
B23K 26/00
US Classification:
21912176
Abstract:
The present invention generally describes one ore more apparatuses and various methods that are used to perform an annealing process on desired regions of a substrate. In one embodiment, an amount of energy is delivered to the surface of the substrate to preferentially melt certain desired regions of the substrate to remove unwanted damage created from prior processing steps (e.g., crystal damage from implant processes), more evenly distribute dopants in various regions of the substrate, and/or activate various regions of the substrate. The preferential melting processes will allow more uniform distribution of the dopants in the melted region, due to the increased diffusion rate and solubility of the dopant atoms in the molten region of the substrate. The creation of a melted region thus allows: 1) the dopant atoms to redistribute more uniformly, 2) defects created in prior processing steps to be removed, and 3) regions that have hyper-abrupt dopant concentrations to be formed.
Control profile
Timothy K Thomas from Belmont, NC, age ~37 Get Report