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Albert R Depetrillo

from Citrus Heights, CA
Age ~86
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Also known as:
Albert Robert Depetrillo, Al Depetrillo, Al Detetrillo, Albert R Petrillo
Related to:
Kevin Petrillo, 60Olga E Depetrillo, 60Valerie J Pfiester, 50Bryan Christopher Depetrillo, 56Sally R Cabrera, 57Valerie Janelle Depetrillo, 50Phyllis A Depetrillo, 75Nancy Depetrillo
Connected to:
Faye X Depetris, 57Kristina Depetris, 44Lorelle A Depetrio, 48Pamela J Depetris, 73Sharon L Depetrillo, 64Shirley J Depetris, 83Virginia A Depetrillo, 78Lisa A Depetro, 57Matthew J Depetro, 41Alfred M Depew, 72

Albert Depetrillo Phones & Addresses

  • Citrus Heights, CA
  • 196 Silberhorn Dr, Folsom, CA 95630 (916) 984-0972 (916) 984-4621
  • 2081 Morrill Ave, San Jose, CA 95132
  • Sunnyvale, CA
  • Sacramento, CA
  • 8637 Kingdale Ave, Orangevale, CA 95662 (916) 802-2066

Work

Position: Machine Operators, Assemblers, and Inspectors Occupations

Education

Degree: Graduate or professional degree

Resumes

Resumes

Albert Depetrillo Photo 1

Albert Depetrillo

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Location:
Sacramento, California Area
Industry:
Semiconductors
Albert Depetrillo Photo 2

Albert Depetrillo

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Publications

Us Patents

Modular Icp Torch Assembly

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US Patent:
7429714, Sep 30, 2008
Filed:
Jun 20, 2003
Appl. No.:
10/601711
Inventors:
Albert R. DePetrillo - Folsom CA, US
Craig R. Heden - Pacifica CA, US
Robert M. McGuire - Aptos CA, US
Assignee:
Ronal Systems Corporation - Mountain View CA
International Classification:
B23K 9/00
US Classification:
21912148, 21912149, 2191215
Abstract:
A modular inductively coupled plasma torch assembly is described. A rear connector unit is positioned and detachably held at a rear end of a tubular plasma chamber to provide a flow of material into it. Detachable connector units are positioned on opposite ends of a tubular jacket, and hold the tubular plasma chamber concentrically within the tubular jacket so as to define an annular chamber between the two tubes. An inductor coil is disposed concentrically around the tubular jacket and energized so as to generate plasma from the material flowing in the tubular plasma chamber. To cool the tubular plasma chamber, coolant flows through the annular chamber using inlet and outlet ports in the detachable connector units for such flow of coolant.

Host And Ancillary Tool Interface Methodology For Distributed Processing

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US Patent:
7375035, May 20, 2008
Filed:
Apr 29, 2003
Appl. No.:
10/426593
Inventors:
Craig R. Heden - Pacifica CA, US
Albert R. DePetrillo - Folsom CA, US
Robert M. McGuire - Aptos CA, US
Assignee:
Ronal Systems Corporation - Morgan Hill CA
International Classification:
H01L 21/302
H01L 21/461
H01L 21/20
H01L 21/36
B01J 10/00
US Classification:
438710, 700 1, 700 9, 700 11, 700 12, 700 17, 700 18, 700 19, 700 20, 700 23, 700 28, 700 90, 700108, 700117, 700121, 700123, 700266, 700268, 700275, 422129, 438478, 438479, 438480, 438689, 438706
Abstract:
A host and ancillary tool interface methodology for distributed processing is described. The host tool manages a process, except for the generation of a product used in the process. To generate the product, the host tool provides an indication to an ancillary tool that the product is to be generated, and the ancillary tool generates the product after detection of the indication with no further intervention by the host tool. To provide the indication, the host tool preferably activates a control line whose voltage is monitored by the ancillary tool, or alternatively, sets one or more bits in a memory which is periodically checked by the ancillary tool.

Method And System For Generating Water Vapor

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US Patent:
20040265215, Dec 30, 2004
Filed:
Jun 24, 2004
Appl. No.:
10/876115
Inventors:
Don DeCarli - Santa Clara CA, US
Albert DePetrillo - Folsom CA, US
Eric Newton - San Jose CA, US
International Classification:
C07C002/72
B01J008/00
US Classification:
423/580100, 422/198000, 422/190000, 422/211000, 422/222000
Abstract:
A technique for generating water vapor involves providing oxygen and hydrogen to a heated reaction chamber that includes a porous reaction structure enclosed within an encapsulation structure. The porous reaction structure, which may include an open-celled ceramic structure, provides sufficient heat exchange and mixing to cause the oxygen and hydrogen to combine to form water vapor. The reaction chamber can be easily and safely heated using resistance, infrared lamp, radio frequency or other heating sources to a temperature above the reaction temperature required to ensure the reaction and conversion of oxygen and hydrogen to water vapor.
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Albert R Depetrillo from Citrus Heights, CA, age ~86 Get Report