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Andre V Desert

from Pomona, NY
Age ~73
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Also known as:
Andre Besert, Desert Andre
Related to:
Sandra L Desert, 49Marjorie Laurent, 35Sandra AndreJean Laurent, 74
Connected to:
Bertrand J Desert, 60Marilene J Desert, 73Annette Deserto, 73Suzanne Deserto, 58Ma Desesma, 86Matthew P Desessa, 37Alexis J Deseta, 38Anand B Desetty, 45Princesa Desevilla, 57Anne Desfilis, 41

Andre Desert Phones & Addresses

  • Pomona, NY
  • 14 Orchard St, Spring Valley, NY 10977 (845) 425-2470
  • 21 Ternure Ave, Spring Valley, NY 10977 (845) 425-2470
  • Lantana, FL
  • Oklahoma City, OK
  • Miramar, FL

Publications

Us Patents

Method Of Making Low Magnetic Permeability Cobalt Sputter Targets

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US Patent:
61769444, Jan 23, 2001
Filed:
Nov 1, 1999
Appl. No.:
9/430988
Inventors:
Alfred Snowman - Englewood NJ
Holger Koenigsmann - Valley Cottage NY
Andre Desert - Spring Valley NY
Thomas J. Hunt - Peekskill NY
Assignee:
Praxair S.T. Technology, Inc. - Danbury CT
International Classification:
H01F 100
C23C 1434
US Classification:
148121
Abstract:
The present invention provides a high purity cobalt sputter target having a single phase h. c. p. structure and a magnetic permeability less than the intrinsic magnetic permeability of the material. Substantially pure cobalt is cast and slowly cooled, such as at a rate of 15. degree. C. /min. Or less, to form a cast target of single phase h. c. p. crystallographic structure. This cast target is hot worked at a temperature of at least about 1000. degree. C. to impart a strain of about 65% or greater into the cobalt material, followed by a slow, controlled cooling to room temperature, such as at a rate of 15. degree. C. /min. or less, to maintain the single phase h. c. p. crystallographic structure. The cooled target is then cold worked at substantially room temperature to impart a strain of about 5-20%. The sputter target of the present invention processed by this method has a magnetic permeability of less than about 9, grain sizes in the size range of about 70-160. mu.

Determination Of Actual Defect Size In Cathode Sputter Targets Subjected To Ultrasonic Inspection

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US Patent:
62696998, Aug 7, 2001
Filed:
Nov 1, 1999
Appl. No.:
9/431745
Inventors:
Paul S. Gilman - Suffern NY
Alfred Snowman - Englewood NJ
Andre Desert - Spring Valley NY
Assignee:
Praxair S. T. Technology, Inc. - North Haven CT
International Classification:
G01N 2910
US Classification:
73601
Abstract:
A method for determining actual size of internal target defects by ultrasonic inspection is provided in which the amplitude of signals generated by ultrasonic inspection are compared to metallurgical size measurements obtained through the use of optical microscopes or scanning electron microscopes or scanning election microscopes. From this comparison, a correlation factor may be obtained to determine the accuracy of the ultrasonic measurements. For a particular sputter target material, defect sizes obtained by ultrasonic inspection may then be multiplied by the correlation factor to determine the actual defect size for that defect. The use of actual defect sizes to determine defect sizes from ultrasonic inspection provides a more accurate determination of defect sizes than prior methods and provides a reliable means for accepting or rejecting targets for critical circuit manufacturing operations.
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Andre V Desert from Pomona, NY, age ~73 Get Report