Inventors:
Hong Shih - Walnut CA, US
Yaobo Yin - Pleasanton CA, US
Shun Jackson Wu - Cupertino CA, US
Armen Avoyan - Glendale CA, US
John E. Daugherty - Newark CA, US
Linda Jiang - Milpitas CA, US
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
B08B 3/04
US Classification:
134 26, 427488, 427489, 427490, 427491, 427523, 427524, 427525, 427526, 427527, 427528, 427529, 427530, 427531, 427533, 427534, 427535, 427536, 427537, 427538, 427539, 427562, 427563, 427564, 427569, 427570, 427571, 427572, 427573, 427574, 427575, 427576, 427577, 427578, 427579, 216 52, 216 53, 216 67, 216 83, 216 84, 216 96, 216 99, 216100, 216101, 216102, 216103, 216104, 216105, 216106, 216107, 216108, 216109, 134 1, 134 2, 134 3, 134 28, 134 34, 134 36, 134 41, 134 42, 1341041, 134150, 134166 R, 134170
Abstract:
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications and manufacturing yields are enhanced. Pre-cleaning of tools used in the cleaning process helps prevent contamination of the electrode being cleaned.