US Patent:
20160137799, May 19, 2016
Inventors:
- Upton NY, US
Charles T. Black - New York NY, US
Atikur Rahman - Ridge NY, US
Benjamin M. Ocko - Stony Brook NY, US
International Classification:
C08J 7/12
H01J 37/32
C08J 7/06
Abstract:
Technologies are described for methods and systems effective for etching nanostructures in a substrate. The methods may comprise depositing a patterned block copolymer on the substrate. The methods may comprise applying a precursor to the patterned block copolymer to generate an infiltrated block copolymer. The precursor may infiltrate into the first polymer block domain and generate a material. The methods may comprise applying a removal agent effective to remove the polymer block domains to the infiltrated block copolymer to generate a pattern of the material. The methods may comprise etching the substrate. The pattern of the material may mask the substrate to pattern the etching. The etching may be performed under conditions to produce nanostructures in the substrate. The methods may comprise removing the pattern of the material and coating the nanostructures and the surface of the substrate with a hydrophobic coating.
