Allen Park - San Jose CA, US Youseung Jin - Hwasung-City, KR SungChan Cho - Hwasung-Si, KR Barry Saville - Gansevoort NY, US
Assignee:
KLA-TENCOR CORPORATION - Milpitas CA
International Classification:
G06F 17/50
US Classification:
716136
Abstract:
The present invention includes defining a multiple patterns of interest utilizing design data of the device; generating a design based classification database, the DBC database including design data associated with each of the POIs; receiving one or more inspection results; comparing the inspection results to each of the plurality of POIs in order to identify an occurrence of at least one of the POIs in the inspection results; determining yield impact of each POI utilizing process yield data; monitoring a frequency of occurrence of each of the POIs and the criticality of the POIs in order to identify process excursions of the device; and determining a device risk level by calculating a normalized polygon frequency for the device utilizing a frequency of occurrence for each of the critical polygons and a criticality for each of the critical polygons, the critical polygons defined utilizing design data of the device.