Inventors:
Dariush Hosseinpour - Edison NJ, US
Heng Cai - Skillman NJ, US
Assignee:
Revlon Consumer Products Corporation - New York NY
International Classification:
A61K 8/44
A61K 8/35
A61Q 3/02
Abstract:
The present invention is directed to a nail enamel composition that includes a photoinitiator, a co-initiator, and an oligomer. The nail enamel composition exhibits increased hardness, toughness, scratch resistance, adhesion, and chip resistance when applied to a natural or synthetic nail.