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Dean T Plaisted

from Kennebunk, ME
Age ~63
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Also known as:
Dean T Plaistead, Dean T Plasted
Phone and address:
9 Carriedale Ln, Kennebunk, ME 04043
(207) 985-5511
Related to:
Dorothy A Bennett, 74Richard G Bennett, 90
Connected to:
Bradley A Plaisted, 75Dale M Plaisted, 75Delise M Plaisted, 52Ernest H Plaisted, 90Frederick A Plaisted, 62Kelli Plaisted, 31Kip O Plaisted, 45Lloyd S Plaisted, 84Rod C Plaisted, 61Sam K Plaisted, 76

Dean Plaisted Phones & Addresses

  • 9 Carriedale Ln, Kennebunk, ME 04043 (207) 985-5511
  • Oxford, ME
  • Biddeford, ME
  • Kennebunkport, ME
  • Lewiston, ME
  • Paris, ME
  • 9 Carriedale Ln, Kennebunk, ME 04043

Work

Company: Soleras advanced coatings Jan 1981 Address: Biddeford Maine Position: Business unit manager, advanced targets

Education

Degree: N/A School / High School: SoHK 1981 Specialities: Industrial metal working

Skills

Coatings • Materials Science • Continuous Improvement • Lean Manufacturing • Six Sigma • Engineering • Photovoltaics • Solar Energy • Thin Films • Manufacturing • Process Improvement • Semiconductors • Stage-Gate • Negotiation • Metals

Industries

Mining & Metals

Resumes

Resumes

Dean Plaisted Photo 1

Bu Manager Soleras Advanced Coatings

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Position:
Business Unit Manager, Advanced Targets at Soleras Advanced Coatings
Location:
Biddeford, Maine
Industry:
Mining & Metals
Work:
Soleras Advanced Coatings - Biddeford Maine since Jan 1981
Business Unit Manager, Advanced Targets
Education:
SoHK 1981
N/A, Industrial metal working
Skills:
Coatings
Materials Science
Continuous Improvement
Lean Manufacturing
Six Sigma
Engineering
Photovoltaics
Solar Energy
Thin Films
Manufacturing
Process Improvement
Semiconductors
Stage-Gate
Negotiation
Metals

Business Records

Name / Title
Company / Classification
Phones & Addresses
Dean Plaisted
Owner
Soleras Limited
Electroplating, Plating, Polishing, Anodizing...
Po Box 1867, Biddeford, ME 04005
Website: soleras.com
Dean Plaisted
President
Soleras Ltd.
Industrial and Commercial Machinery and Equip...
589 Elm St, Biddeford, ME 04005
Dean Plaisted
President
Soleras Limited
Manufacturers' Agents & Representatives
589 Elm St, Biddeford, ME 04005
(207) 282-5699, (207) 284-6118
Dean Plaisted
President
SOLERAS ADVANCED COATINGS LTD
Mfg Industrial Machinery
PO Box 1867, Biddeford, ME 04005
589 Elm St, Biddeford, ME 04005
(207) 282-5699
Dean Plaisted
Owner
Soleras Limited
Electroplating, Plating, Polishing, Anodizing...
Po Box 1867, Biddeford, ME 04005
Website: soleras.com
Dean Plaisted
President
Soleras Ltd.
Industrial and Commercial Machinery and Equip...
589 Elm St, Biddeford, ME 04005

Publications

Us Patents

Method Of Manufacturing A Rotary Sputtering Target Using A Mold

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US Patent:
7922066, Apr 12, 2011
Filed:
Sep 21, 2006
Appl. No.:
11/534205
Inventors:
Al Nolette - Biddeford ME, US
Paul Carter - Waterboro ME, US
Dean Plaisted - Kennebunk ME, US
Alan Plaisted - Swanton VT, US
Assignee:
Soleras, LTd. - Biddeford ME
International Classification:
B23K 1/00
B23K 31/02
C23C 14/00
US Classification:
228132, 228134, 228256, 20429812
Abstract:
The process that is the subject of this invention is a method of making a rotary sputtering target having the steps of providing a cylinder of sputtering target material having an adhesion-wetting layer on its inside surface; providing a stainless steel sputtering target backing tube having an outside diameter smaller than the sputtering target material inside diameter, the backing tube having an adhesion-wetting layer on its outside surface; welding an upper and lower stainless steel retaining ring to the backing tube adjacent to the sputtering target material so that the target material is in compression and the backing tube in tension; and introducing molten bonding material into the annulus between the backing tube and the sputtering target material. The apparatus that is the subject of the present invention is a rotary sputtering target apparatus having a cylinder of sputtering target material; a backing tube having a smaller outside diameter than the inside diameter of the sputtering target material; and bonding material disposed between the target material and backing tube, the bonding material bonding them together.

Gravity-Fed In-Line Continuous Processing System And Method

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US Patent:
20030213432, Nov 20, 2003
Filed:
Mar 27, 2003
Appl. No.:
10/400775
Inventors:
Donald Parent - Windham ME, US
Dean Plaisted - Kennebunk ME, US
Michael Asbas - Alfred ME, US
International Classification:
C23C016/00
H01L021/306
C23F001/00
US Classification:
118/719000, 156/345310
Abstract:
A gravity-fed in-line continuous processing system includes at least one processing chamber disposed between a first load lock and a second load lock. The second load lock is disposed lower than the first load lock. A first device isolates the processing chamber from the first load lock. A second device isolates the processing chamber from the second load lock. There is at least one track through the processing chamber and the first and second load locks. The track is structured and arranged such that an article slides thereon under the force of gravity.

Rotary Barrel Gate Valve

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US Patent:
20030213929, Nov 20, 2003
Filed:
Mar 27, 2003
Appl. No.:
10/401001
Inventors:
Donald Parent - Windham ME, US
Dean Plaisted - Kennebunk ME, US
Michael Asbas - Alfred ME, US
International Classification:
F16K031/44
US Classification:
251/161000, 251/162000, 251/229000, 137/625650
Abstract:
A rotary barrel gate valve includes a body and at least one passage through the body defining an inlet and an outlet. There is a first actuator for rotating the body, a second actuator for translating the body, and a sealing portion on the body which seals the body with respect to an opening into a chamber adjacent the body.

Gravity-Fed In-Line Continuous Processing System And Method

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US Patent:
20050058776, Mar 17, 2005
Filed:
Oct 28, 2004
Appl. No.:
10/975910
Inventors:
Donald Parent - Windham ME, US
Dean Plaisted - Kennebunk ME, US
Michael Asbas - Alfred ME, US
International Classification:
B05D003/00
US Classification:
427294000
Abstract:
A method for coating substrates includes providing at least one processing chamber and disposing the processing chamber between a first load lock and a second load lock, the second load lock disposed lower than the first load lock. The method further includes isolating the processing chamber from the first load lock, isolating the processing chamber from the second load lock, and providing at least one track through the processing chamber and the first and second load locks and structuring and arranging the track such that an article slides thereon under the force of gravity.

Gravity-Fed In-Line Continuous Processing System And Method

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US Patent:
20060251814, Nov 9, 2006
Filed:
Jul 7, 2006
Appl. No.:
11/482643
Inventors:
Donald Parent - Windham ME, US
Dean Plaisted - Kennebunk ME, US
Michael Asbas - Alfred ME, US
International Classification:
C23C 16/00
US Classification:
427255500, 118719000, 118733000
Abstract:
A method for coating substrates includes providing at least one processing chamber and disposing the processing chamber between a first load lock and a second load lock, the second load lock disposed lower than the first load lock. The method further includes isolating the processing chamber from the first load lock, isolating the processing chamber from the second load lock, and providing at least one track through the processing chamber and the first and second load locks and structuring and arranging the track such that an article slides thereon under the force of gravity.

Gravity-Fed In-Line Continuous Processing System And Method

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US Patent:
20060283391, Dec 21, 2006
Filed:
Aug 24, 2006
Appl. No.:
11/509451
Inventors:
Donald Parent - Windham ME, US
Dean Plaisted - Kennebunk ME, US
Michael Asbas - Alfred ME, US
International Classification:
C23C 16/00
US Classification:
118719000, 118733000
Abstract:
A gravity-fed in-line continuous processing system includes at least one processing chamber disposed between a first load lock and a second load lock. The second load lock is disposed lower than the first load lock. A first device isolates the processing chamber from the first load lock. A second device isolates the processing chamber from the second load lock. There is at least one track through the processing chamber and the first and second load locks. The track is structured and arranged such that an article slides thereon under the force of gravity.

Cathode Incorporating Fixed Or Rotating Target In Combination With A Moving Magnet Assembly And Applications Thereof

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US Patent:
20070089983, Apr 26, 2007
Filed:
Oct 24, 2006
Appl. No.:
11/552270
Inventors:
Dean Plaisted - Kennebunk ME, US
Alan Plaisted - Swanton VT, US
Assignee:
SOLERAS LTD. - Biddeford ME
International Classification:
C23C 14/32
C23C 14/00
US Classification:
204298010, 204192100
Abstract:
A sputtering cathode apparatus having a hollow cylindrical sputter target that is fixed or rotatable about its central axis and an internal magnet assembly that is rotated axially within the sputter target.

Rotary Sputtering Target And Apparatus For Manufacture

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US Patent:
20110168555, Jul 14, 2011
Filed:
Mar 21, 2011
Appl. No.:
13/052484
Inventors:
Al Nolette - Biddeford ME, US
Paul Carter - Waterboro ME, US
Dean Plaisted - Kennebunk ME, US
Alan Plaisted - Swanton VT, US
Assignee:
SOLERAS, LTD. - Biddeford ME
International Classification:
C23C 14/34
US Classification:
20429812
Abstract:
The process that is the subject of this invention is a method of making a rotary sputtering target having the steps of providing a cylinder of sputtering target material having an adhesion-wetting layer on its inside surface; providing a stainless steel sputtering target backing tube having an outside diameter smaller than the sputtering target material inside diameter, the backing tube having an adhesion-wetting layer on its outside surface; welding an upper and lower stainless steel retaining ring to the backing tube adjacent to the sputtering target material so that the target material is in compression and the backing tube in tension; and introducing molten bonding material into the annulus between the backing tube and the sputtering target material.The apparatus that is the subject of the present invention is a rotary sputtering target apparatus having a cylinder of sputtering target material; a backing tube having a smaller outside diameter than the inside diameter of the sputtering target material; and bonding material disposed between the target material and backing tube, the bonding material bonding them together.
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Dean T Plaisted from Kennebunk, ME, age ~63 Get Report