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Dong Koo Phones & Addresses

  • San Diego, CA
  • Los Gatos, CA
  • Goleta, CA

Publications

Us Patents

Method For Improved Cleaning Of Substrate Processing Systems

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US Patent:
61258598, Oct 3, 2000
Filed:
Jul 11, 1997
Appl. No.:
8/893922
Inventors:
Karl Anthony Littau - Palo Alto CA
Anand Vasudev - San Jose CA
Dong Won Koo - Rahway NJ
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01L 2100
US Classification:
134 11
Abstract:
A method for a multiple-stage microwave plasma cleaning technique for efficiently cleaning a substrate processing chamber. In a specific embodiment, a two-stage cleaning process is described. The first stage begins by flowing a reactive gas from a gas source into a processing chamber where microwaves ignite and maintain a plasma from the reactive gas. Reactive radicals generated which react with residues on the interior surfaces of the processing chamber. In the second stage, an inert gas is flowed into the processing chamber in addition to the reactive gas. Microwaves then ignite and maintain a plasma from the reactive gas and optionally, the inert gas as well. Optionally, an inert gas can be flowed into the processing chamber prior to the first stage to remove loose particles from the processing chamber. The reactive gas in such embodiments is preferably NF. sub. 3, but other fluorine-containing gases such as carbon tetrafluoride (CF. sub.
Dong B Koo from San Diego, CA, age ~37 Get Report