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John M Ferro

from San Diego, CA
Age ~70
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Also known as:
Jon M Ferro, Jon Martin Ferro, Jon Tr Ferro, Jack P Ferro, Joseph P Ferro
Related to:
Janusz Marian Czech, 31Owen Ferro, 37Lois A Ferro, 95Jack P FerroJack P Ferro, 42Raymond E Troha, 85Carl F Czech, 73James J FerroPenelope Ferro, 65Owen P Ferro, 40Joseph P Ferro, 98Marcia S Araujo, 62
Connected to:
Alexa Ferro, 33Andre P Ferro, 55Asia Ferro, 38Dinorah Ferro, 63Domonic Ferro, 60Eugene J Ferro, 48Gonzalo Ferro, 75Jason P Ferro, 44Justine H Ferro, 55Karino C Ferro, 30

John Ferro Phones & Addresses

  • San Diego, CA
  • Tucson, AZ
  • Cardiff by the Sea, CA

Professional Records

Medicine Doctors

John Ferro Photo 1

John A. Ferro

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Specialties:
Neurology
Work:
Rockland Neurological AssocsRockland Neurological Associates
2 Crosfield Ave STE 202, West Nyack, NY 10994
(845) 353-4344 (phone), (845) 353-2661 (fax)
Education:
Medical School
Albert Einstein College of Medicine at Yeshiva University
Graduated: 1988
Procedures:
Inner Ear Tests
Lumbar Puncture
Neurological Testing
Sleep and EEG Testing
Conditions:
Alzheimer's Disease
Carpel Tunnel Syndrome
Ischemic Stroke
Multiple Sclerosis (MS)
Parkinson's Disease
Languages:
English
Spanish
Description:
Dr. Ferro graduated from the Albert Einstein College of Medicine at Yeshiva University in 1988. He works in West Nyack, NY and specializes in Neurology. Dr. Ferro is affiliated with Nyack Hospital.

Lawyers & Attorneys

John Ferro Photo 2

John Ferro - Lawyer

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ISLN:
922873362
Admitted:
2004
University:
Touro

Publications

Us Patents

System For Manufacturing An Optical Lens

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US Patent:
7234810, Jun 26, 2007
Filed:
Sep 7, 2004
Appl. No.:
10/936132
Inventors:
Laurence Warden - Poway CA, US
Andreas W. Dreher - Escondido CA, US
John Ferro - Santa Rosa CA, US
Jagdish M. Jethmalani - San Diego CA, US
Shui T. Lai - Encinitas CA, US
Assignee:
Ophthonix, Inc. - San Diego CA
International Classification:
G02C 7/02
US Classification:
351177
Abstract:
A system for manufacturing an optical lens that is configured to correct optical aberrations, including, e. g. , high order aberrations such as described by Zernike polynomials. The system can include a measurement system configured to measure optical aberrations in a patient's eye and to create measured optical aberration data. A calculation system is configured to receive the measured optical aberration data and to determine a lens definition based on the measured optical aberration data. A fabrication system is configured to produce a correcting lens based on the lens definition.

System For Manufacturing An Optical Lens

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US Patent:
7497573, Mar 3, 2009
Filed:
Dec 6, 2006
Appl. No.:
11/634637
Inventors:
Laurence Warden - Poway CA, US
Andreas W. Dreher - Escondido CA, US
John Ferro - Santa Rosa CA, US
Jagdish M. Jethmalani - San Diego CA, US
Shui T. Lai - Encinitas CA, US
Assignee:
Ophthonix, Inc. - Vista CA
International Classification:
A61B 3/00
G02C 7/02
US Classification:
351200, 351177
Abstract:
A system for manufacturing an optical lens that is configured to correct optical aberrations, including, e. g. , high order aberrations such as described by Zemike polynomials. The system can include a measurement system configured to measure optical aberrations in a patient's eye and to create measured optical aberration data. A calculation system is configured to receive the measured optical aberration data and to determine a lens definition based on the measured optical aberration data. A fabrication system is configured to produce a correcting lens based on the lens definition.

Lensometers And Wavefront Sensors And Methods Of Measuring Aberration

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US Patent:
7659971, Feb 9, 2010
Filed:
Jan 24, 2008
Appl. No.:
12/019614
Inventors:
Laurence Warden - Poway CA, US
John Ferro - Santa Rosa CA, US
Andreas W. Dreher - Escondido CA, US
William G. Foote - Poway CA, US
Assignee:
Ophthonix, Inc. - Vista CA
International Classification:
G01B 9/00
US Classification:
356124
Abstract:
Wavefront measuring systems and methods are disclosed which may be employed, for example, in detecting phase aberrations in a spectacle lens and in an eye. Various embodiments include disposing a modulation pattern in the path of a return beam from the spectacle lens or the eye, and imaging a diffraction pattern at a self-imaging plane relative to the modulation pattern with a detector. The diffraction pattern is analyzed and the results are used to produce a representation of the wavefront phase characteristics that describe aberrations in the lens or eye being measured. Illumination and processing techniques for improving the measurement results are disclosed. Various embodiments comprise systems adaptable to both measure aberrations in lenses in spectacles as well as in a patient's eyes.

System For Manufacturing An Optical Lens

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US Patent:
8002407, Aug 23, 2011
Filed:
Feb 26, 2009
Appl. No.:
12/393975
Inventors:
Laurence Warden - Poway CA, US
Andreas W. Dreher - Escondido CA, US
John Ferro - Santa Rosa CA, US
Jagdish M. Jethmalani - San Diego CA, US
Shui T. Lai - Encinitas CA, US
Assignee:
Ophthonix, Inc. - Vista CA
International Classification:
A61B 3/00
G02C 7/02
US Classification:
351200, 351159, 351177
Abstract:
A system for manufacturing an optical lens that is configured to correct optical aberrations, including, e. g. , high order aberrations such as described by Zernike polynomials. The system can include a measurement system configured to measure optical aberrations in a patient's eye and to create measured optical aberration data. A calculation system is configured to receive the measured optical aberration data and to determine a lens definition based on the measured optical aberration data. A fabrication system is configured to produce a correcting lens based on the lens definition.

Vision Correction Lenses

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US Patent:
8636359, Jan 28, 2014
Filed:
Jul 19, 2011
Appl. No.:
13/186413
Inventors:
Laurence Warden - Poway CA, US
Andreas W. Dreher - Escondido CA, US
John Ferro - Santa Rosa CA, US
Jagdish M. Jethmalani - San Diego CA, US
Shui T. Lai - Encinitas CA, US
Assignee:
Essilor International (Compagnie General d'Optique) - Charenton Cedex
International Classification:
G02C 7/02
G02C 7/10
US Classification:
35115976, 35115961, 35115962, 35115978
Abstract:
A method of customizing vision correction including measuring optical aberration data of a patient's eye and calculating a lens definition based on the optical aberration data, wherein calculating the lens definition comprises calculating a correction of at least one low order aberration and at least one high order aberration and is based at least partly on the patient's pupil size.

Lensometers And Wavefront Sensors And Methods Of Measuring Aberration

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US Patent:
20050105044, May 19, 2005
Filed:
Oct 22, 2004
Appl. No.:
10/971937
Inventors:
Laurence Warden - Poway CA, US
John Ferro - Santa Rosa CA, US
Andreas Dreher - Escondido CA, US
William Foote - Poway CA, US
International Classification:
G02C007/02
US Classification:
351159000
Abstract:
Wavefront measuring systems and methods are disclosed which may be employed, for example, in detecting phase aberrations in a spectacle lens and in an eye. Various embodiments include disposing a modulation pattern in the path of a return beam from the spectacle lens or the eye, and imaging a diffraction pattern at a self-imaging plane relative to the modulation pattern with a detector. The diffraction pattern is analyzed and the results are used to produce a representation of the wavefront phase characteristics that describe aberrations in the lens or eye being measured. Illumination and processing techniques for improving the measurement results are dislcosed. Various embodiments comprise systems adaptable to both measure aberrations in lenses in spectacles as well as in a patient's eyes.
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John M Ferro from San Diego, CA, age ~70 Get Report