Inventors:
Kenneth M. Skulina - Livermore CA
Richard M. Bionta - Livermore CA
Daniel M. Makowiecki - Livermore CA
Craig S. Alford - Tracy CA
Assignee:
The Regents of the University of California - Oakland CA
International Classification:
C23C 1434
US Classification:
20419227, 20419215, 20419226
Abstract:
Beryllium-based multilayer structures and a process for fabricating beryllium-based multilayer mirrors, useful in the wavelength region greater than the beryllium K-edge (111 or 11. 1 nm). The process includes alternating sputter deposition of beryllium and a metal, typically from the fifth row of the periodic table, such as niobium (Nb), molybdenum (Mo), ruthenium (Ru), and rhodium (Rh). The process includes not only the method of sputtering the materials, but the industrial hygiene controls for safe handling of beryllium. The mirrors made in accordance with the process may be utilized in soft x-ray and extreme-ultraviolet projection lithography, which requires mirrors of high reflectivity ( 60%) for x-rays in the range of 60-140 (60-14. 0 nm).